Novel approaches to the design of halftone masks for analog lithography

Discontinued Devices LC-R 3000 Spatial Light Modulators
Digital-/ Computer Holography/ CGH Lithography
Published on:
Authors: Marcel Teschke and Stefan Sinzinger
Abstract:
“We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.”

Restricted Access

Publication: Applied Optics
Issue/Year: Applied Optics, Vol. 47, Issue 26, pp. 4767-4776 (2008)
DOI: 10.1364/AO.47.004767
Link: https://doi.org/10.1364/AO.47.004767

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