Papers & References

Maskless Photolithography By Holographic Optical Projection

PLUTO / PLUTO-2 Spatial Light Modulators
Digital-/ Computer Holography/ CGH Lithography
Published on:
Authors: T D Wilkinson, C. Bay, and J. Freeman
Abstract:

We present an inexpensive novel rapid prototyping approach to a maskless and fully adaptive photolithographic process. Phase-only computer-generated holograms of lithographic masks displayed on a liquid-crystal-on-silicon spatial light modulator were used in a holographic optical lithography system. Using holographic projection allows diffraction-limited performance within the given parameters of the optical system, adaptive software refocusing, and a continuous, pixel-free pattern. With the demonstrator, we have successfully proven the concept for micrometer-size lithographic features.

Restricted Access

Publication: Imaging and Applied Optics
Issue/Year: Imaging and Applied Optics 2014, OSA Technical Digest (online), paper DW1B.3.
DOI: 10.1364/DH.2014.DW1B.3
Link: https://doi.org/10.1364/DH.2014.DW1B.3
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