Author(s): Marcel Teschke and Stefan Sinzinger


“We report novel approaches to the design of halftone masks for analog lithography. The approaches are derived from interferometric phase contrast. In a first step we show that the interferometric phase-contrast method with detour holograms can be reduced into a single binary mask. In a second step we introduce the interferometric phase-contrast method by interference of the object wavefront with the conjugate object wavefront. This method also allows for a design of a halftone mask. To use kinoform holograms as halftone phase masks, we show in a third step the combination of the zeroth-order phase-contrast technique with the interferometric phase-contrast method.”

Link to Publications Page

Publication: Applied Optics, (subscription required)

Issue/Year/DOI: Applied Optics, Vol. 47, Issue 26, pp. 4767-4776 (2008)