Author(s): Marcel Teschke, Robert Heyer, Marco Fritzsche, Sebastian Stoebenau, Stefan Sinzinger

Abstract:

“A novel approach for the fabrication of diffractive optical elements is described. This approach is based on an interferometric phase contrast method that transforms a complex object wavefront into an intensity pattern. The resulting intensity pattern is used to expose a photoresist layer on a substrate. After development, a diffractive phase object with an on-axis diffraction pattern is achieved. We show that the interferometric phase contrast method allows a precise control of the resulting intensity pattern. An array of blazed Fresnel lenses is realized in photoresist by using kinoform or detour-phase computer holograms for the interferometric phase contrast setup.”

Link to Publications Page

Publication: Applied Optics, (subscription required)

Issue/Year/DOI: Applied Optics, Vol. 47, Issue 14, pp. 2550-2556 (2008)
doi:10.1364/AO.47.002550